Author Archives: TDF Staff

May 25, 2016

DAC 2016 preview: Real Intent

The functional verification specialist will discuss the latest updates to Ascent and Meridian - and offer top quality espresso at this year's conference.
Article  |  Topics: Conferences, RTL, Verification  |  Tags: , ,   |  Organizations:
May 25, 2016

DAC 2016 preview: Mentor Graphics

An overview of the vendor's busy DAC program from panels to technical sessions to a one-to-one with Wally Rhines.
May 24, 2016

DAC 2016 preview: Gary Smith EDA

The company's annual 'What to see' list is now available for download and highlights some of EDA's less recognized areas of innovation.
Article  |  Topics: Conferences, Blog - EDA  |  Tags: , , ,   |  Organizations:
April 20, 2016

Toward easier, faster test pattern simulation

Validating test patterns is a notoriously tricky and laborious process. Mentor Graphics has some new ideas on that front.
Article  |  Topics: Blog - EDA, - Tested Component to System, Verification  |  Tags: , , , , ,   |  Organizations:
February 22, 2016

DVCon United States 2016 preview: Real Intent

Verification specialist's DVCon activities are headlined by a panel on emulation and static verification.
February 22, 2016

DVCon United States 2016 preview: Mentor Graphics

Mentor Graphics chairman and CEO Wally Rhines will deliver the DVCon keynote as the vendor sets a deep agenda for the conference.
February 11, 2016

SPIE Advanced Lithography Preview: Mentor Graphics

The Calibre vendor will have a strong technical presence at the leading lithography conference taking place in late February in San Jose.
January 20, 2016

Catching complex CDC bugs in large SoCs

A look at techniques to trap complex errors caused by signals crossing clock, reset and power domains is the focus of this upcoming webinar
Article  |  Topics: Conferences, Verification  |  Tags: , , , ,   |  Organizations:
January 14, 2016

DesignCon 2016 preview: Mentor Graphics

HyperLynx leads the way for vendor at DesignCon with booth demos and a day-long modeling and analysis seminar.
December 7, 2015

Asymmetric variability issues could impact 7nm processes

Simulation shows 7nm process will need tighter variability control than expected, and possibly accommodation for asymmetric variability
Article  |  Topics: Conferences, Design to Silicon  |  Tags: , , ,   |  Organizations: , ,