opc

DTCO (design technology co-optimization) looks to address systemic verification challenges but the process still needs to be extended.

Mentor takes the wraps off new machine learning fueled features in its HLS and physical design families ahead of DAC 2019.

Innovation and advances in EUV and OPC lead Mentor's offerings at SPIE in San Jose later this month.

The major West Coast technical conference for lithography is just two weeks away and offers a packed agenda.

The Calibre vendor will have a strong technical presence at the leading lithography conference taking place in late February in San Jose.