inverse lithography


April 4, 2023

Curvilinear layout looks to wider adoption with mask speedups

Nvidia's move into software aimed at mask production and EDA looks to be part of a wider shift to improve yields.
Article  |  Topics: Blog - EDA  |  Tags: , , , ,   |  Organizations: , , ,
February 11, 2016

SPIE Advanced Lithography Preview: Mentor Graphics

The Calibre vendor will have a strong technical presence at the leading lithography conference taking place in late February in San Jose.

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