Tech Design Forum
Briefing
inverse lithography
inverse lithography
April 4, 2023
Curvilinear layout looks to wider adoption with mask speedups
Nvidia's move into software aimed at mask production and EDA looks to be part of a wider shift to improve yields.
Article | Topics:
Blog - EDA
| Tags:
curvilinear design
,
EUV
,
inverse lithography
,
lithography
,
mask
| Organizations:
D2S
,
Micron Technology
,
nVidia
,
TSMC
February 11, 2016
SPIE Advanced Lithography Preview: Mentor Graphics
The Calibre vendor will have a strong technical presence at the leading lithography conference taking place in late February in San Jose.
Article | Topics:
Conferences
,
Design to Silicon
,
Blog - EDA
| Tags:
design for yield
,
directed self-assembly
,
double patterning
,
EUV
,
inverse lithography
,
lithography
,
modeling
,
opc
| Organizations:
AMD
,
GlobalFoundries
,
IBM
,
Mentor Graphics
,
Samsung Electronics
,
SK Hynix
,
SMIC
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