April 4, 2023
Nvidia's move into software aimed at mask production and EDA looks to be part of a wider shift to improve yields.
July 11, 2022
Aki Fujimura of mask specialist D2S sees curved shapes as key to improving die yield and performance but it needs EDA support.
July 29, 2020
A Mentor-Samsung collaboration cuts the need for model-based analysis and speeds analysis runtime by as much as 20X.
July 2, 2019
There's still plenty of time to build a busy and profitable agenda for a visit to ES Design West and SEMICON West in San Francisco next week.
May 23, 2019
Mentor takes the wraps off new machine learning fueled features in its HLS and physical design families ahead of DAC 2019.
February 16, 2018
Innovation and advances in EUV and OPC lead Mentor's offerings at SPIE in San Jose later this month.
February 13, 2017
The major West Coast technical conference for lithography is just two weeks away and offers a packed agenda.
February 11, 2016
The Calibre vendor will have a strong technical presence at the leading lithography conference taking place in late February in San Jose.
October 9, 2015
IMEC and Cadence have taped out a test chip intended to explore key lithography and metal-interconnect issues that will face users of the forthcoming 5nm process node.
June 19, 2015
Following Mentor's acquisition of Tanner EDA, management expect the integration will help with a drive into IoT applications and systems that need to go beyond standard IC lithography.