lithography

July 2, 2019

The road to ES Design West: Location, location, location

There's still plenty of time to build a busy and profitable agenda for a visit to ES Design West and SEMICON West in San Francisco next week.
May 23, 2019

AI and ML fuel Catapult and Calibre updates

Mentor takes the wraps off new machine learning fueled features in its HLS and physical design families ahead of DAC 2019.
February 16, 2018

SPIE Advanced Lithography 2018 preview: Mentor

Innovation and advances in EUV and OPC lead Mentor's offerings at SPIE in San Jose later this month.
Article  |  Topics: Conferences, Design to Silicon  |  Tags: , , , , , , ,   |  Organizations: ,
February 13, 2017

SPIE Advanced Lithography preview: Mentor Graphics

The major West Coast technical conference for lithography is just two weeks away and offers a packed agenda.
February 11, 2016

SPIE Advanced Lithography Preview: Mentor Graphics

The Calibre vendor will have a strong technical presence at the leading lithography conference taking place in late February in San Jose.
October 9, 2015

IMEC 5nm test chip to explore EUV and SAQP litho options

IMEC and Cadence have taped out a test chip intended to explore key lithography and metal-interconnect issues that will face users of the forthcoming 5nm process node.
Article  |  Topics: Blog - EDA  |  Tags: , , , ,   |  Organizations: ,
June 19, 2015

Tanner integration to assist Mentor in IoT and photonics

Following Mentor's acquisition of Tanner EDA, management expect the integration will help with a drive into IoT applications and systems that need to go beyond standard IC lithography.
Article  |  Topics: Blog - EDA, PCB  |  Tags: , , , , , ,   |  Organizations: ,
June 18, 2015

The road to 7nm sees patterning multiply

Is the industry ready to go beyond 10nm when it comes to lithography? Lithography researcher Professor David Pan sees design and process co-operation as the key approach.
Article  |  Topics: Blog - EDA  |  Tags: , , , , ,   |  Organizations: , ,
November 4, 2014

From Darwin to Mao: how multi-patterning could move up the flow

Are we torn between evolution and revolution? Mentor Graphics' Joe Sawicki discusses how pattern matching already in fabs could move up and radically alter the design flow.
December 11, 2012

Semiconductor roadmap gets fuzzier at IEDM

Semiconductor process options outlined at IEDM by Luc van den Hove of imec as industry faces hard choices and rising costs

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