AMD

June 6, 2019

Calibre scales to 4000 nodes for faster sign off in the cloud

AMD used Calibre with optimisations implemented for cloud support to slash runtimes on high-end server processor designs.
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February 11, 2019

DVCon USA 2019 preview: Mentor

DVCon USA is coming soon. Mentor's 2019 involvement includes a keynote from parent Siemens and a tutorial on managing your formal verification processes.
July 27, 2018

Verification engineers embrace emulation for the shift left

In a panel session at June's DAC, Synopsys customers talked about some of the ways they make verification more efficient and bring technologies such as formal, emulation, and simulation together.
July 3, 2018

Fusion improves timing say Synopsys users

Early-access customers talked about their experiences with the Synopsys Fusion-based flow in a panel session at the DAC.
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September 21, 2017

GlobalFoundries adds 12nm finFET process

GlobalFoundries intends to offer a 12nm FinFET process as a stepping stone from its 14nm process.
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June 10, 2016

DFT to expand its role for long-term yield

Design for test could look quite different in five years' time compared to the situation designers have today as chipmakers wrestle with the problems of yield control, safety, and aging.
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June 1, 2016

Computex 2016: Microsoft makes play to be the VR OS

Microsoft has launched an OEM version of the Windows Holographic platform it has developed for its own AR headset, the HoloLens.
April 13, 2016

User2User preview: Silicon Valley edition rolls out this month

Companies presenting at User2User Santa Clara on April 26 include AMD, Microsoft, nVidia, Oracle, Qualcomm, and Samsung.
March 31, 2016

53rd DAC conference program announced

The 53rd Design Automation Conference has published its program for the upcoming event in Austin, Texas, which will include keynotes from AMD, nVidia, and NXP Semiconductors and tracks that connect electronics to biology.
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February 11, 2016

SPIE Advanced Lithography Preview: Mentor Graphics

The Calibre vendor will have a strong technical presence at the leading lithography conference taking place in late February in San Jose.

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