mask

Nvidia's move into software aimed at mask production and EDA looks to be part of a wider shift to improve yields.

Aki Fujimura of mask specialist D2S sees curved shapes as key to improving die yield and performance but it needs EDA support.

Dialog Semiconductor aims to expand its use of configurable mixed-signal circuitry across its product line following its acquisition of specialist Silego a year ago.

Cadence Design Systems has worked with Lumerical Solutions and PhoeniX Software to develop a flow for designing photonic ICs based on the Virtuoso custom-design platform.

EUV may be getting most R&D cash but the world's biggest foundry says e-beam currently has the edge on defects and double patterning.