mask


April 4, 2023

Curvilinear layout looks to wider adoption with mask speedups

Nvidia's move into software aimed at mask production and EDA looks to be part of a wider shift to improve yields.
Article  |  Topics: Blog - EDA  |  Tags: , , , ,   |  Organizations: , , ,
July 11, 2022

Fujimura asks EDA to bend towards manufacturability

Aki Fujimura of mask specialist D2S sees curved shapes as key to improving die yield and performance but it needs EDA support.
Article  |  Topics: Blog - EDA  |  Tags: , , , , , , , ,   |  Organizations: ,
September 19, 2018

Dialog plans configurable mixed-signal expansion

Dialog Semiconductor aims to expand its use of configurable mixed-signal circuitry across its product line following its acquisition of specialist Silego a year ago.
Article  |  Topics: Blog - PCB  |  Tags: ,   |  Organizations:
December 7, 2015

Cadence partners for photonic IC design

Cadence Design Systems has worked with Lumerical Solutions and PhoeniX Software to develop a flow for designing photonic ICs based on the Virtuoso custom-design platform.
Article  |  Topics: Blog - EDA  |  Tags: , , ,   |  Organizations:
September 11, 2014

TSMC: e-beam winning on cost over EUV for lithography

EUV may be getting most R&D cash but the world's biggest foundry says e-beam currently has the edge on defects and double patterning.
Article  |  Topics: Design to Silicon, Blog - EDA  |  Tags: , , , , , , ,   |  Organizations: , , ,

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