Tech Design Forum
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RET
RET
February 13, 2017
SPIE Advanced Lithography preview: Mentor Graphics
The major West Coast technical conference for lithography is just two weeks away and offers a packed agenda.
Article | Topics:
Blog Topics
,
Conferences
,
Design to Silicon
,
Blog - EDA
| Tags:
directed self-assembly
,
hotspot
,
lithography
,
mask synthesis
,
multi patterning
,
opc
,
pattern matching
,
RET
,
silicon photonics
,
triple patterning
| Organizations:
GlobalFoundries
,
Mentor Graphics
,
Samsung Electronics
,
Shanghai Huali Microelectronics
,
SMIC
,
STMicroelectronics
,
University of Texas
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