RET

February 13, 2017

SPIE Advanced Lithography preview: Mentor Graphics

The major West Coast technical conference for lithography is just two weeks away and offers a packed agenda.

Article | Topics: Blog Topics, Conferences, Design to Silicon, Blog - EDA | Tags: directed self-assembly, hotspot, lithography, mask synthesis, multi patterning, opc, pattern matching, RET, silicon photonics, triple patterning | Organizations: GlobalFoundries, Mentor Graphics, Samsung Electronics, Shanghai Huali Microelectronics, SMIC, STMicroelectronics, University of Texas

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