lithography

Is the industry ready to go beyond 10nm when it comes to lithography? Lithography researcher Professor David Pan sees design and process co-operation as the key approach.

Are we torn between evolution and revolution? Mentor Graphics' Joe Sawicki discusses how pattern matching already in fabs could move up and radically alter the design flow.

Semiconductor process options outlined at IEDM by Luc van den Hove of imec as industry faces hard choices and rising costs

Tackling the three key challenges of 20nm processes: design complexity; the physics of lithography; and economics.

TSMC follows Intel in taking a stake in ASML to accelerate development of EUV and 450mm lithography equipment.

Ever increasing lithography challenges mean the next generation of design rules may concentrate on telling you just what you can rather than what you cannot do.