D2S

April 4, 2023

Curvilinear layout looks to wider adoption with mask speedups

Nvidia's move into software aimed at mask production and EDA looks to be part of a wider shift to improve yields.

Article | Topics: Blog - EDA | Tags: curvilinear design, EUV, inverse lithography, lithography, mask | Organizations: D2S, Micron Technology, nVidia, TSMC

July 11, 2022

Fujimura asks EDA to bend towards manufacturability

Aki Fujimura of mask specialist D2S sees curved shapes as key to improving die yield and performance but it needs EDA support.

Article | Topics: Blog - EDA | Tags: curvilinear design, DAC 2022, DFM, diagonal routing, DRC, lithography, mask, memory, routing | Organizations: D2S, Siemens EDA

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