Tech Design Forum
Briefing
optical proximity correction
optical proximity correction
September 3, 2019
EDA with ‘AI inside’ – Mentor’s Joe Sawicki offers an insider’s view
Mentor has a host of tools - some public, some not - that leverage AI and ML. EVP Joe Sawicki has been describing the strategy behind their development.
Article | Topics:
Commentary
,
Design to Silicon
,
DFM
,
Digital/analog implementation
,
Blog - EDA
,
- ESL/SystemC
,
HLS
,
Next Generation Design
,
Tool development
| Tags:
AI for EDA
,
artificial intelligence
,
design management
,
machine learning
,
ML
,
optical proximity correction
,
physical design
,
place and route
,
training data
| Organizations:
Siemens EDA
May 23, 2019
AI and ML fuel Catapult and Calibre updates
Mentor takes the wraps off new machine learning fueled features in its HLS and physical design families ahead of DAC 2019.
Article | Topics:
Conferences
,
Design to Silicon
,
Blog - EDA
,
- HLS
| Tags:
AI for EDA
,
artificial intelligence
,
calibre
,
Catapult
,
high level synthesis (HLS)
,
HLS
,
lithography
,
machine learning
,
ML
,
opc
,
optical proximity correction
,
simulation
| Organizations:
DAC 2019
,
Siemens EDA
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