December 19, 2016
DDR memory subsystems need careful optimisation as demands on memory grow more rapidly than off-chip bandwidth.
October 10, 2016
STMicroelectronics, Samsung, GSI Technology and Synopsys talk about the challenges of doing AMS design on finFET processes.
August 27, 2016
Synopsys video details challenges of 10nm design and its collaboration with Samsung Semiconductor to build a full flow to address them.
May 25, 2016
An overview of the vendor's busy DAC program from panels to technical sessions to a one-to-one with Wally Rhines.
April 13, 2016
Companies presenting at User2User Santa Clara on April 26 include AMD, Microsoft, nVidia, Oracle, Qualcomm, and Samsung.
April 7, 2016
But project lead Chenming Hu, 'finFET's father', has also highlighted important changes in the funding landscape for university research.
February 11, 2016
The Calibre vendor will have a strong technical presence at the leading lithography conference taking place in late February in San Jose.
December 7, 2015
Simulation shows 7nm process will need tighter variability control than expected, and possibly accommodation for asymmetric variability
October 6, 2015
Samsung bases PRISM and FLARE defect analysis and optimization on Mentor Graphics' Calibre and Tessent. Yields rise. Ramps shorten.
August 6, 2015
Flow exploration helps designers establish best approach to advanced network processor implementation on Samsung finFET process