14/16nm


October 10, 2016

Speeding up AMS design in the age of finFETs

STMicroelectronics, Samsung, GSI Technology and Synopsys talk about the challenges of doing AMS design on finFET processes.
Article  |  Topics: Conferences, Design to Silicon  |  Tags: , , ,   |  Organizations: ,
October 1, 2014

Liberty changes bring together nanometer OCV techniques

The Liberty library format has been extended to cope with the most common forms of on-chip variation analysis in use today on nanometer processes.
Article  |  Topics: Blog - EDA  |  Tags: , , , ,   |  Organizations: ,

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