Chipmaker

July 30, 2015

10nm flow reveals complexity of finFET design process

Collaboration between ARM, TSMC and Synopsys reveals challenges of 10nm finFET design flows.
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July 28, 2015

Samsung applies early prediction and color management to 10nm plans

Rapid virtual prototyping and a metal stack that's more designer friendly are two of the ways in which Samsung aims to build up foundry market share for its 14nm and 10nm finFET processes.
July 9, 2015

IBM and friends at 7nm: breakthrough or science project?

IBM, GlobalFoundries, Samsung and SUNY deserve kudos for manufacturing the first 7nm chip but the NREs involved still look frightening.
June 30, 2015

Chipmakers see 3x test-pattern saving in embedded-test logic

Companies such as Broadcom are experiencing threefold test-pattern reductions through the use of automatically inserted gates that allow parallel cones to share the same ATPG patterns that would not be possible using conventional test generation schemes.
Article  |  Topics: Blog - EDA  |  Tags: , ,   |  Organizations: ,
June 25, 2015

X-Fab updates 180nm SOI process for automotive and industrial applications

Foundry claims isolation and device integration advantages for 180nm SOI process, help to absorb extra costs of SOI wafers
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June 18, 2015

The road to 7nm sees patterning multiply

Is the industry ready to go beyond 10nm when it comes to lithography? Lithography researcher Professor David Pan sees design and process co-operation as the key approach.
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June 16, 2015

Collaboration let HiSilicon accelerate 16nm finFET plans

HiSilicon claims close collaboration with foundry and EDA tools partners helped speed up plans to tape out the first 16nm finFET-based design through TSMC.
June 10, 2015

SoC verification ‘should use software more’

Verification of SoCs can't be done by adapting IP-level strategies - it'll take a much greater interaction with software, and the use of a shared language
June 10, 2015

TSMC adds Cadence and Imagination subsystems for IoT

Foundry strikes two more Internet of Things subsystem deals for its 55nm ULP process based on Cadence Tensilica and Imagination MIPS/PowerVR cores.
June 9, 2015

COMPUTEX 2015: Wrap II – New customers

Electronics design needs to cope with a combination of major brands and tiny start-ups looking to exploit its skills even where their resources are thin.
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