July 11, 2022
Aki Fujimura of mask specialist D2S sees curved shapes as key to improving die yield and performance but it needs EDA support.
September 4, 2019
Non-volatile alternatives to flash are finally moving out of the lab as Applied Materials launches production tools and Arm starts pushing MRAM.
June 13, 2019
AI, its system design implications and its impact on EDA tools themselves will be a key theme for ES Design West next month.
July 9, 2015
IBM, GlobalFoundries, Samsung and SUNY deserve kudos for manufacturing the first 7nm chip but the NREs involved still look frightening.
September 11, 2014
EUV may be getting most R&D cash but the world's biggest foundry says e-beam currently has the edge on defects and double patterning.
June 13, 2014
Panel discusses Moore's law scaling beyond the 14nm node to 5nm, where economic, device, interconnect, materials, lithography and design issues abound
October 4, 2012
The semiconductor industry is reaching a crunch point at which companies that form it have to work together much more closely, says Malcolm Penn of Future Horizons.
August 6, 2012
TSMC follows Intel in taking a stake in ASML to accelerate development of EUV and 450mm lithography equipment.