TSMC: e-beam winning on cost over EUV for lithography
EUV may be getting most R&D cash but the world's biggest foundry says e-beam currently has the edge on defects and double patterning.
e-beam
Gartner: Multi-patterning here to stay, EUV lithography still 50:50
Plan around 193nm immersion lithography. Alternatives are years off and not guaranteed, says analyst group
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