e-beam


September 11, 2014

TSMC: e-beam winning on cost over EUV for lithography

EUV may be getting most R&D cash but the world's biggest foundry says e-beam currently has the edge on defects and double patterning.
Article  |  Topics: Design to Silicon, Blog - EDA  |  Tags: , , , , , , ,   |  Organizations: , , ,
May 22, 2013

Gartner: Multi-patterning here to stay, EUV lithography still 50:50

Plan around 193nm immersion lithography. Alternatives are years off and not guaranteed, says analyst group
Article  |  Topics: Design to Silicon, Blog - EDA  |  Tags: , , , ,   |  Organizations:

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