Author Archives: Chris Edwards

About Chris Edwards

Chris Edwards has spent a long time covering electronics and EDA. He is a former Editor-in-Chief of Electronic Engineering Times UK and electronics editor of the IET's Engineering & Technology. His work has appeared in a variety of international newspapers including The Guardian, The Daily Telegraph, The Age and the South China Morning Post.
June 27, 2018

EDA needs to work on the back end, says Qualcomm

It’s the back-end that needs work as system-level considerations begin to dominate design, Qualcomm’s vice president of engineering said at DAC.
Article  |  Topics: Blog - EDA, PCB  |  Tags: , , , , ,   |  Organizations:
June 27, 2018

Remember the design gap? It’s back

Fifteen years on from the design gap that triggered the IP revolution, implementation costs have created a new one.
Article  |  Topics: Blog - EDA  |  Tags: , , ,   |  Organizations: , ,
June 26, 2018

EDA learns to love AI

Machine learning is gradually moving into implementation and verification tools for EDA.
June 25, 2018

IoT devices need surprises, Amazon claims

IoT device makers should play more with their software and make use of techniques used in website design to increase overall usability, Amazon’s head of IoT analytics has claimed.
Article  |  Topics: Blog - Embedded  |  Tags: , , , ,   |  Organizations:
June 25, 2018

Cadence puts tools in the cloud

Cadence Design Systems has made a collection of its tools suitable for cloud computing, providing them for both Cadence- and customer-managed environments.
Article  |  Topics: Blog - EDA  |  Tags: , ,   |  Organizations:
June 25, 2018

Node-variant FinFET tweaks try to improve cost, performance

Foundries have taken aim at standard-cell track height and design-rule tweaks to try to improve the area efficiency and performance of derivative finFET processes.
Article  |  Topics: Blog - EDA, IP  |  Tags: , , , , , ,   |  Organizations: , ,
June 22, 2018

Imec stacks transistors for denser 3nm option

Imec proposes using stacked CMOS transistors and buried power rails to improve density for the 3nm process node.
Article  |  Topics: Blog Topics  |  Tags: , , , , ,   |  Organizations:
June 22, 2018

GlobalFoundries plays with metal gear in search for solid gains

At VLSI Symposia 2018, GlobalFoundries researchers proposed looking at the metal-gate ‘gear’ ratio as a way of improving the routability of standard cells.
Article  |  Topics: Blog - EDA  |  Tags: , , , , , ,   |  Organizations:
June 21, 2018

AI is all about low-energy hardware says Dally

For nVidia chief scientist and Stanford professor Bill Dally, now is a great time to be involved in hardware design, thanks to the rise of AI.
Article  |  Topics: Blog - EDA, Embedded  |  Tags: , , , , , ,   |  Organizations: ,
June 21, 2018

Samsung couples EUV with DTCO for 7nm shrink

Samsung Electronics expects to increase savings on die area in the shift from its 10nm to 7nm node by applying both EUV for critical layers and several layout-focused process changes.
Article  |  Topics: Blog - EDA  |  Tags: , , , ,   |  Organizations: