Master parasitic extraction for leading-edge designs
A comprehensive guide to parasitics, how to perform parasitic extraction and the latest technologies available for this critical task.
GlobalFoundries
How to achieve fast, automated, sign-off verification of DFM hotspot fixes in P&R
A collaboration between GlobalFoundries and Mentor has resulted in an innovative in-design fixing strategy across markets such as IoT, mobile, RF, graphics and networking.
How to gain a competitive edge with advanced DFT
Learn how the latest design for test innovations deliver efficiency and profitability across the design flow.
Preparing for success at the next node with Calibre
How Mentor develops and works with partners to prepare each version of its Calibre DFM platform to be ready for the introduction of each new process node.
Enhanced model-based hinting may be the edge you need below 20nm
A detailed dive into how MBH strategies for litho hotspots have been enhanced to deal with double patterning at 20nm and below.
EUV’s arrival demands a new resolution enhancement flow
Gandharv Bhatara looks at how the OPC and RET elements of Calibre are getting ready for the EUV age.
Design space exploration finds hotspots during early process development
A new technique has been developed to catch potential new lithography issues when little design data is available for incoming nodes.
Assessing the true cost of node transitions
John Ferguson reviews the key capital metrics you need to review when deciding whether to move to a new process.
Silicon photonics moves out of the shadows
An alphabet soup of AI, HPC, 5G and the IoT has finally seeded creation of a design infrastructure for silicon photonics.
How Applied Materials and fab partners are harnessing machine learning
The equipment giant's Computational Process Control strategy takes a pragmatic approach to Industry 4.0 and is likely to influence EDA tools for incoming nodes.
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