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March 22, 2017
How Applied Materials and fab partners are harnessing machine learning
The equipment giant's Computational Process Control strategy takes a pragmatic approach to Industry 4.0 and is likely to influence EDA tools for incoming nodes.
Article | Topics:
EDA - DFM
| Tags:
10nm
,
5nm
,
etch
,
fab
,
lithography
,
machine learning
,
process control
,
PVD
| Organizations:
Applied Materials
,
GlobalFoundries
,
Samsung Semiconductor
,
TSMC
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