You must understand six comparison concerns and their effect on database equivalency. Adopt a solution with an in-depth object-based approach.
What are the options and how do you balance overarching CAD requirements and personal preferences?
Because of the high analog content in memory designs, designers must understand how various effects impact reliability and performance.
Innovation is extending the technique's power across areas such as context-aware layout, accounting for multi-patterning and implementing fill.
How Calibre is evolving to address the challenges of LVS verification in early-stage design.
How to remove or extract portions of a layout for easier, more focused and faster project delivery.
The authors descirbe a new signature-based approach to resolving the content of layouts in GDSII, OASIS and other formats.
In-design DRC is a technique that frees up engineers from many of the challenges of delivering AMS design under ever more complex design rules.
An alphabet soup of AI, HPC, 5G and the IoT has finally seeded creation of a design infrastructure for silicon photonics.
Multi-patterning, finFETs and more are forcing more detailed overhauls of P&R software at each process node. We dig into some of the key new issues and how they are being addressed.
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