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September 11, 2018
EUV’s arrival demands a new resolution enhancement flow
Gandharv Bhatara looks at how the OPC and RET elements of Calibre are getting ready for the EUV age.
Expert Insight | Topics:
EDA - DFM
,
- EDA Topics
| Tags:
3nm
,
5nm
,
7nm
,
EUV
,
lithography
,
multi-patterning
,
OPC
,
RET
| Organizations:
GlobalFoundries
,
Imec
,
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