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double pattering
double pattering
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(2)
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(2)
December 31, 2018
Enhanced model-based hinting may be the edge you need below 20nm
A detailed dive into how MBH strategies for litho hotspots have been enhanced to deal with double patterning at 20nm and below.
Article | Topics:
EDA - DFM
| Tags:
10nm
,
12nm
,
20nm
,
double pattering
,
lithography
,
MBH
,
model-based hinting
| Organizations:
GlobalFoundries
,
Samsung Semiconductor
,
Siemens EDA
,
TSMC
,
UMC
November 24, 2017
Assessing the true cost of node transitions
John Ferguson reviews the key capital metrics you need to review when deciding whether to move to a new process.
Expert Insight | Topics:
EDA - DFM
,
IC Implementation
,
Verification
| Tags:
20nm
,
22nm
,
28nm
,
CBA
,
compute resources
,
cost-benefit analysis
,
double pattering
,
Moore's Law
,
multi-patterning
,
training
| Organizations:
GlobalFoundries
,
Intel
,
Samsung Semiconductor
,
Siemens EDA
,
TSMC
,
UMC
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