How Mentor develops and works with partners to prepare each version of its Calibre DFM platform to be ready for the introduction of each new process node.
A detailed dive into how MBH strategies for litho hotspots have been enhanced to deal with double patterning at 20nm and below.
A new technique has been developed to catch potential new lithography issues when little design data is available for incoming nodes.
John Ferguson reviews the key capital metrics you need to review when deciding whether to move to a new process.
The equipment giant's Computational Process Control strategy takes a pragmatic approach to Industry 4.0 and is likely to influence EDA tools for incoming nodes.
Moving to a finFET process means considering process readiness, cost and yield, as well as the traditional power, performance and area advantages
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