Preparing for success at the next node with Calibre
How Mentor develops and works with partners to prepare each version of its Calibre DFM platform to be ready for the introduction of each new process node.
Samsung Semiconductor
Enhanced model-based hinting may be the edge you need below 20nm
A detailed dive into how MBH strategies for litho hotspots have been enhanced to deal with double patterning at 20nm and below.
Design space exploration finds hotspots during early process development
A new technique has been developed to catch potential new lithography issues when little design data is available for incoming nodes.
Assessing the true cost of node transitions
John Ferguson reviews the key capital metrics you need to review when deciding whether to move to a new process.
How Applied Materials and fab partners are harnessing machine learning
The equipment giant's Computational Process Control strategy takes a pragmatic approach to Industry 4.0 and is likely to influence EDA tools for incoming nodes.
Six key criteria for deciding to migrate to a finFET process
Moving to a finFET process means considering process readiness, cost and yield, as well as the traditional power, performance and area advantages
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