DFM

February 1, 2018
Design space exploration feature

Design space exploration finds hotspots during early process development

A new technique has been developed to catch potential new lithography issues when little design data is available for incoming nodes.
January 15, 2018
Physical Verification Efficiencies - featured image

Three ways to lift productivity during physical verification

How to get the best PV results by reducing computational demands; handling data more efficiently and exploiting parallelization.
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November 24, 2017
John Ferguson is the Director of Marketing for Calibre DRC Applications at Mentor, a Siemens Business, in Wilsonville, Oregon, with extensive experience in physical design verification. He holds a BS degree in Physics from McGill University, an MS in Applied Physics from the University of Massachusetts, and a PhD in Electrical Engineering from the Oregon Graduate Institute of Science and Technology.

Assessing the true cost of node transitions

John Ferguson reviews the key capital metrics you need to review when deciding whether to move to a new process.
October 27, 2017
Featured image - double patterning at advanced nodes

Catch multi-patterning errors clearly at advanced nodes

How to address increasingly complex patterning issues and debug them efficiently as design moves toward 12 and 10nm.
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September 21, 2017
Diagnosis-driven yield analysis featured image

Yield is money – and other truths of diagnosis-driven yield analysis

Diagnosis-driven yield analysis identifies the cause of systematic yield loss to speed the ramp-to-volume on new processes and improve yield on mature ones.
September 14, 2017
Featured image - Silicon photonics

Silicon photonics moves out of the shadows

An alphabet soup of AI, HPC, 5G and the IoT has finally seeded creation of a design infrastructure for silicon photonics.
August 30, 2017
DTCO for early lithography issue identification - featured image

Your next node: find lithography issues early with DTCO

Pattern-based design/technology co-optimization (DTCO) estimates lithographic difficulty during the early stages of a new process technology node.
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May 8, 2017
Dr Walden Rhines is Chairman and CEO of Mentor - A Siemens Business

The Wally Rhines interview – Part One: Mentor as a Siemens business

Our extended fireside chat with Mentor Chairman and CEO Wally Rhines begins by canvassing his thoughts now the Siemens deal is done.
March 22, 2017
Computational Process Control feature

How Applied Materials and fab partners are harnessing machine learning

The equipment giant's Computational Process Control strategy takes a pragmatic approach to Industry 4.0 and is likely to influence EDA tools for incoming nodes.
October 3, 2016
Place and route beyond 10nm

How place and route is adapting to challenges below 10nm

Multi-patterning, finFETs and more are forcing more detailed overhauls of P&R software at each process node. We dig into some of the key new issues and how they are being addressed.

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