A new technique has been developed to catch potential new lithography issues when little design data is available for incoming nodes.
How to get the best PV results by reducing computational demands; handling data more efficiently and exploiting parallelization.
John Ferguson reviews the key capital metrics you need to review when deciding whether to move to a new process.
How to address increasingly complex patterning issues and debug them efficiently as design moves toward 12 and 10nm.
Diagnosis-driven yield analysis identifies the cause of systematic yield loss to speed the ramp-to-volume on new processes and improve yield on mature ones.
An alphabet soup of AI, HPC, 5G and the IoT has finally seeded creation of a design infrastructure for silicon photonics.
Pattern-based design/technology co-optimization (DTCO) estimates lithographic difficulty during the early stages of a new process technology node.
Our extended fireside chat with Mentor Chairman and CEO Wally Rhines begins by canvassing his thoughts now the Siemens deal is done.
The equipment giant's Computational Process Control strategy takes a pragmatic approach to Industry 4.0 and is likely to influence EDA tools for incoming nodes.
Multi-patterning, finFETs and more are forcing more detailed overhauls of P&R software at each process node. We dig into some of the key new issues and how they are being addressed.
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