A collaboration between GlobalFoundries and Mentor has resulted in an innovative in-design fixing strategy across markets such as IoT, mobile, RF, graphics and networking.
This case study shows how rising CMP simulation quality can be leveraged to detect the position and type of planarity hotspots before manufacture and verify the planarity of a layout.
Learn how the latest design for test innovations deliver efficiency and profitability across the design flow.
Master the three prerequisites of format translation and chose the right one from the various translation strategies.
How Mentor develops and works with partners to prepare each version of its Calibre DFM platform to be ready for the introduction of each new process node.
A detailed dive into how MBH strategies for litho hotspots have been enhanced to deal with double patterning at 20nm and below.
Adoption of high-density advanced packaging (HDAP) needs tools and supports to build designers' confidence in the emerging technology.
Gandharv Bhatara looks at how the OPC and RET elements of Calibre are getting ready for the EUV age.
A new technique has been developed to catch potential new lithography issues when little design data is available for incoming nodes.
John Ferguson reviews the key capital metrics you need to review when deciding whether to move to a new process.
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