Foundry

May 21, 2019
Calibre node introduction feature - May 2019

Preparing for success at the next node with Calibre

How Mentor develops and works with partners to prepare each version of its Calibre DFM platform to be ready for the introduction of each new process node.
December 31, 2018
MBH featured image

Enhanced model-based hinting may be the edge you need below 20nm

A detailed dive into how MBH strategies for litho hotspots have been enhanced to deal with double patterning at 20nm and below.
Article  |  Topics: EDA - DFM  |  Tags: , , , , , ,   |  Organizations: , , , ,
November 20, 2018
HDAP_FeaturedImage

Adding system-level, post-layout electrical analysis to HDAP design and verification

Adoption of high-density advanced packaging (HDAP) needs tools and supports to build designers' confidence in the emerging technology.
Article  |  Topics: EDA - IC Implementation, Verification  |  Tags: , , , , , ,   |  Organizations: , ,
September 11, 2018
Gandharv Bhatara is the product marketing manager for the Calibre OPC/RET products at Mentor, a Siemens Business.

EUV’s arrival demands a new resolution enhancement flow

Gandharv Bhatara looks at how the OPC and RET elements of Calibre are getting ready for the EUV age.
Expert Insight  |  Topics: EDA - DFM, - EDA Topics  |  Tags: , , , , , , ,   |  Organizations: , ,
February 1, 2018
Design space exploration feature

Design space exploration finds hotspots during early process development

A new technique has been developed to catch potential new lithography issues when little design data is available for incoming nodes.
November 24, 2017
John Ferguson is the Director of Marketing for Calibre DRC Applications at Mentor, a Siemens Business, in Wilsonville, Oregon, with extensive experience in physical design verification. He holds a BS degree in Physics from McGill University, an MS in Applied Physics from the University of Massachusetts, and a PhD in Electrical Engineering from the Oregon Graduate Institute of Science and Technology.

Assessing the true cost of node transitions

John Ferguson reviews the key capital metrics you need to review when deciding whether to move to a new process.
September 14, 2017
Featured image - Silicon photonics

Silicon photonics moves out of the shadows

An alphabet soup of AI, HPC, 5G and the IoT has finally seeded creation of a design infrastructure for silicon photonics.
March 22, 2017
Computational Process Control feature

How Applied Materials and fab partners are harnessing machine learning

The equipment giant's Computational Process Control strategy takes a pragmatic approach to Industry 4.0 and is likely to influence EDA tools for incoming nodes.
November 29, 2016
Ken Brock, product marketing manager, Synopsys

Six ways to exploit the advantages of finFETs

FinFET processes and libraries are maturing, enabling designers to explore the best ways to take advantage of the capabilities of the new transistor design
Expert Insight  |  Topics: EDA - IC Implementation, IP - Selection  |  Tags: , , ,   |  Organizations: ,
October 29, 2015
Innovus chip layout

Cadence’s path to digital implementation on 10nm

The 10nm process will see changes to multiple patterning that demands changes in the implementation flow, along with an increased focus on the effects of variability.

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