TSMC fills in sub-nodes as EUV gains ground
TSMC is using its growing experience with EUV lithography to fill in sub-nodes between its major releases as it prepares to extend finFET technology to the forthcoming N3 process.
TSMC is using its growing experience with EUV lithography to fill in sub-nodes between its major releases as it prepares to extend finFET technology to the forthcoming N3 process.
Cadence has developed a stimulus optimizer based on neural networks to try to improve the runtime of constrained-random verification runs.
An RF Laboratories engineer provides some tips and techniques in the context of the PADS Professional suite.
Recent developments have made Open-RAN look more attractive as a way of implementing 5G systems. This is helping to drive a shift-left in verification and test.
Arm works with EDA to find new efficiencies based on extra CTL-based check in Questa runs.
A Mentor-Samsung collaboration cuts the need for model-based analysis and speeds analysis runtime by as much as 20X.
DAC provided a forum for the growing number of verification efforts focused on checking the architectural compliance and overall RTL quality of RISC-V processors.
The chair of Accellera’s IP security assurance working group expects the draft standard for hardening hardware core to be out by the end of the year.
Talks in the Design-on-Cloud Pavilion at this year’s DAC demonstrated how the question over its usage is not so much whether design could or should migrate to the cloud but how to optimize cost and performance when it’s there.
DTCO and 3D integration will dominate scaling in the coming decade, TSMC chief scientist Philip Wong claimed in his keynote at DAC on Monday