EDA Topics

November 16, 2012
Synopsys Virtualizer screen shot

The Shift Left: how virtual prototyping reduces risk

The business case behind how virtual prototyping speeds development, improves hardware and software quality, and improves ROI.
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November 16, 2012
Stephen Pateras

IJTAG: delivering an industry platform for IP test and integration

Mentor's Stephen Pateras explains how the proposed IJTAG standard speeds IP test by replacing time-consuming custom and ad hoc methodologies.
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November 16, 2012
Marco Casale-Rossi

3DIC – the advantages and the challenges of vertical integration

The advantages and challenges of 3D IC integration, as we add vertical functional integration options to the traditional planar integration brought by the progress of Moore's Law.
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November 5, 2012
20nm test feature image

20nm test demands new design-for-test and diagnostic strategies

20nm test needs new approaches to cope with short delay defects, new memory failure mechanisms and the consequences of test compression strategies
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October 30, 2012
Mixed-Signal Methodology Guide

Verifying low-power intent in mixed-signal design

An exclusive extract from Cadence Design Systems' Mixed-Signal Methodology Guide provides an excellent overview of its discrete topic and a flavor of the book as a whole.
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October 26, 2012

Emulation delivers system-level power verification

Overcome the time and visibility limitations of simulation and of gate-level and RTL-based strategies to achieve full-chip analysis.
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October 25, 2012

Vivado HLS/AutoESL: Agilent packet engine case study

How Xilinx' Vivado HLS enabled the creation of an in-fabric, processor-free UDP network packet engine
October 23, 2012

Vivado, inside the new Xilinx design suite

The FPGA vendor's new flagship is now on public release. It adds an array of features, including support for system-level to HDL synthesis.
October 11, 2012
Tong Gao

The physical design challenges of 20nm processes

Manufacturability, routing, library design and more - it all needs rethinking at 20nm, writes Tong Gao of Synopsys.
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October 9, 2012

Physical verification of 20nm designs through integrated double-patterning analysis and repair

Finding and fixing double patterning problems in 20nm designs
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