DFM

July 20, 2021
Credit: laborotorio linux

Making sense of cloud EDA

How to carry out a sensible analysis of cloud EDA's potential, so you get the right tools and computational resources to deliver increasingly complex designs.
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May 31, 2021
Srinivas Velivala is a principal product manager with Calibre Design Solutions in Siemens EDA, a part of Siemens Digital Industries Software. His primary focus is the development of Calibre integration and interface tools and technologies. Before joining Siemens EDA, he designed high-density SRAM compilers. In addition to more than 12 years of design and product management experience, Srinivas holds a B.S. and M.S. in Electrical and Computer Engineering.

How you can decide what level of DRC you need when you need it

Using on-demand rule checks during place-and-route boosts efficiency and design quality.
October 16, 2020
Dina Medhat - Mentor

Not using reliability check waivers? You’re wasting valuable time

Reliability rule checks need - and now get - more granular analysis that allows designers to adopt proposed waivers with much greater confidence.
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August 14, 2020
John Ferguson is the product management director for Calibre DRC applications at Mentor, a Siemens BusinessHe holds a B.Sc. degree in Physics from McGill University, an M.Sc. in Applied Physics from the University of Massachusetts, and a Ph.D. in Electrical Engineering from the Oregon Graduate Institute of Science and Technology.

EDA innovation is the foundation of progress

For physical verification and beyond, each process node requires new thinking, new tools and greater performance.
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June 9, 2020
place and route in design automated hotspot fixing

How to achieve fast, automated, sign-off verification of DFM hotspot fixes in P&R

A collaboration between GlobalFoundries and Mentor has resulted in an innovative in-design fixing strategy across markets such as IoT, mobile, RF, graphics and networking.
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May 26, 2020
cloud computing efficiencies with calibre for physical verification

How cloud computing is now delivering efficiencies for IC design

A Mentor-Microsoft-AMD pathfinder demonstrates the potential benefits of cloud-based physical verification.
May 7, 2020
CMP simulation dummy fill featured image

Keep chip designs on the level with CMP simulation and dummy fill optimization

This case study shows how rising CMP simulation quality can be leveraged to detect the position and type of planarity hotspots before manufacture and verify the planarity of a layout.
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March 30, 2020
Featured Image ESD feature

Automate P2P resistance checking for better, faster ESD protection

ESD has always been a major issue but with increasing densities and growing die sizes it is becoming a higher order concern. Automation and vizualization can help manage the task.
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March 17, 2020
FeatIm P&R MaxLinear Mentor

How MaxLinear got faster signoff DRC while optimizing reliability and manufacturability

The RF and AMS specialist turned to design software that allowed it to run design checks during place and route.
January 19, 2020

How to build your GDS to OASIS conversion flow

Master the three prerequisites of format translation and chose the right one from the various translation strategies.
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