process node

August 14, 2020
John Ferguson is the product management director for Calibre DRC applications at Mentor, a Siemens BusinessHe holds a B.Sc. degree in Physics from McGill University, an M.Sc. in Applied Physics from the University of Massachusetts, and a Ph.D. in Electrical Engineering from the Oregon Graduate Institute of Science and Technology.

EDA innovation is the foundation of progress

For physical verification and beyond, each process node requires new thinking, new tools and greater performance.
Expert Insight  |  Topics: EDA - DFM, Verification  |  Tags: , , , , , , , ,   |  Organizations:
August 30, 2017
DTCO for early lithography issue identification - featured image

Your next node: find lithography issues early with DTCO

Pattern-based design/technology co-optimization (DTCO) estimates lithographic difficulty during the early stages of a new process technology node.
Article  |  Topics: EDA - DFM, Verification  |  Tags: , ,   |  Organizations:

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