design rules

August 14, 2020
John Ferguson is the product management director for Calibre DRC applications at Mentor, a Siemens BusinessHe holds a B.Sc. degree in Physics from McGill University, an M.Sc. in Applied Physics from the University of Massachusetts, and a Ph.D. in Electrical Engineering from the Oregon Graduate Institute of Science and Technology.

EDA innovation is the foundation of progress

For physical verification and beyond, each process node requires new thinking, new tools and greater performance.
Expert Insight  |  Topics: EDA - DFM, Verification  |  Tags: , , , , , , , ,   |  Organizations:
January 13, 2014
Multiple patterning is causing issues with access to standard-cell pins in nanometer processes

Cell pin access

Increasingly complex design rules in 14nm and 16nm make it harder to connect local routing to the inputs and outputs (pins) of standard cells.
April 22, 2013
Layout segment showing problem of color splitting with double patterning

The five key challenges of sub-28nm custom and analog design

The arrival of the 20nm and finFET-based 14nm and 16nm processes bring with them challenges for custom IC design. These are the five key areas and a methodology that can address them.

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