Machine learning techniques help ensure the validity of Liberty Variation Format information for OCV analysis at lower process nodes.
Hierarchical signoff strategies for large SoCs at advanced nodes can be effective if sufficient attention is paid to reflecting the impact of cross-hierarchy parasitics.
The 10nm process node calls for the use of SOCV techniques during timing signoff to avoid leaving too much performance on the table.
The 10nm process will see changes to multiple patterning that demands changes in the implementation flow, along with an increased focus on the effects of variability.
In sessions at the 2015 Design Automation Conference, engineers who had worked on finFET-oriented projects revealed how the technology has changed their design practices and where others may want to think twice about making the move.
How Wall Street's vastly resourced IT teams already point the way to cheaper, faster and more efficient verification by putting goals not tools first.
How Marvell used an enhanced ECO tool flow for SoC design to cut overall time-to-timing-closure by nearly 70%.
Accounting for on-chip variation (OCV) has become a critical factor in assuring timing closure for nanometer-scale ICs and avoiding over-pessimistic margins.
Using hierarchy and improved constraints management to accelerate static timing analysis at 20nm and below.
Concurrent multi-corner, multi-mode analysis and optimization is becoming increasingly necessary for sub-65nm designs. Traditional P&R tools force the designers to pick one or two mode corner scenarios due to inherent architectural limitations. As an example of the problem, a cellphone chip typically needs to be designed for 20 mode/corners scenarios. In the absence of a […]