Tech Design Forum Briefing


Briefing Authors

Paul Dempsey

Paul Dempsey Paul Dempsey has been a technology journalist for 20 years. His work has also appeared in EETimes, Red Herring and specialist journals published by the Financial Times.

Luke Collins

Luke Collins Luke Collins is a freelance technology journalist with 22 years’ experience. He is a former Editor-in-Chief of Electronics Times in the UK, and co-founded the IP9x series of conferences.

Chris Edwards

Chris Edwards Chris Edwards has spent two decades covering electronics and EDA. He is a former Editor-in-Chief of Electronic Engineering Times UK and electronics editor of the IET's Engineering & Technology.
October 16, 2012

EDA and IP vendors roll out support for TSMC’s 20nm, 3DIC processes

IP and EDA vendors line up to support TSMC 20nm process, CoWoS 3DIC technology

October 15, 2012

FinFETs face planar fightback at IEDM

Advanced SOI devices with hybrid channel materials may challenge the finFET’s future dominance, says IBM

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October 15, 2012

imec ITF: EUV source power woes threaten Moore’s Law scaling

EUV sources currently deliver around 10 to 15W, but need to be delivering 200W to make them cost effective for production use. Can the industry boost source power by 2014, or are we stuck with slower scaling?

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October 12, 2012

OMG adopts portable image and signal processing libraries

The Object Management Group has adopted the Vector Signal and Image Processing Library (VSIPL) for C and VSIPL++ for C++ as standard specifications that it will manage and promote.

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October 11, 2012

Tech Design Forum moves to new social media homes

Check out our new pages on Twitter, LinkedIn and Facebook

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October 11, 2012

Intel, TSMC finFETs to star at IEDM

Intel finFET family grows to support SoC use, as TSMC boosts p-channel performance with germanium

October 11, 2012

The physical design challenges of 20nm processes

Manufacturability, routing, library design and more – it all needs rethinking at 20nm

October 11, 2012

Is your 20nm process gate-last? Maybe it should be

Modelling work by Gold Standard Simulations indicates that gate-last is the sensible choice at 20nm from a design point of view because of variability problems with gate-first processes.

October 9, 2012

TSMC updates reference flows for 20nm and CoWoS

TSMC has released two reference flows – one for its 20nm and the other for the form of 3D integration favored by the Taiwanese foundry, chip on wafer on substrate (CoWoS).



October 9, 2012

Event alert: TSMC Open Innovation Platform

With the foundry giant set to take the wraps off its latest flows and innovations in just seven days, remember that you must pre-register to attend its Silicon Valley event. Also here are some pre-event pointers.

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