Guides - Tech Design Forum Techniques

May 26, 2014

Design for security

Design for security is an emerging topic in hardware engineering demanding a more holistic approach that traditional cryptographic implementation.
May 26, 2014
Unidirectionally routed M1 using SADP (Source: CMU/IBM)

Triple patterning and self-aligned double patterning (SADP)

In the absence of EUV lithography, the primary option for manufacturing on a 10nm process is to extend double patterning. But the options each have issues.
May 24, 2014
Dopant-level trojan standard cell developed by Georg Becker and coworkers

Hardware trojan attacks and countermeasures

IC designers are becoming increasingly worried about the possibility of third parties inserting malicious 'trojan' circuitry into their ICs.
May 19, 2014

On-chip clock strategies and GALS

The increased use of IP and a rise in process variability is driving a move to look at alternatives to traditional low-skew clock distribution strategies.
May 19, 2014

10nm processes

The 10nm generation is the follow-on process to the 14nm/16nm node and will provide a choice of either finFET or planar FD-SOI architectures. But the likely absence of EUV will increase costs.
May 19, 2014

14nm/16nm processes

The 14nm and 16nm processes cover a range of technologies and are designed to succeed the 20nm generation. They bring with them a number of design challenges.
May 19, 2014

Verification coverage

Verification coverage attempts to at least provide a partial answer to the question: "How do you know you are finished verifying?" It involves the combination of a number of techniques.
January 13, 2014
Interconnect resistance has increased since the 40nm node

Interconnect resistance

A number of effects have led to a dramatic increase in interconnect resistance in the sub-32nm process nodes that demands the use of smarter routing.
January 13, 2014
Multiple patterning is causing issues with access to standard-cell pins in nanometer processes

Cell pin access

Increasingly complex design rules in 14nm and 16nm make it harder to connect local routing to the inputs and outputs (pins) of standard cells.
October 31, 2013

X propagation

X propagation within RTL simulations can hide fatal bugs. Uncovering and eliminating the effect improves design quality and avoids respins.

PLATINUM SPONSORS

Synopsys Cadence Design Systems Mentor - A Siemens Business
View All Sponsors