Guides - Tech Design Forum Techniques

May 23, 2012

VHDL

VHDL is a hardware description language with rich constructs that can model complex systems. It can also be constrained for use as the starting point of an FPGA or ASIC design.
Guide  |  Topics: EDA - IC Implementation  |  Tags: , , , , ,
May 21, 2012

Real-time scheduling

The scheduler is a key component of any real-time operating system (RTOS). This guide describes the concepts employed by common schedulers and the policies they employ.
Guide  |  Topics: Embedded - Platforms  |  Tags: , ,
April 5, 2012

Assertion-based verification

More than half of design companies claim to use ABV but many have yet to deploy full methodologies.
April 5, 2012

FPGA prototyping

Building a prototype SoC in one or a set of FPGAs can aid field trials, software development and hardware/software integration. But it's not easy, so the decision to go ahead needs careful consideration.
March 28, 2012

Verification IP

Verification IP is becoming an increasingly important component for system design due to the rapid proliferation of new protocols and interfaces, chiefly driven by mobile comms.
Guide  |  Topics: EDA - Verification  |  Tags: , , , , , , , , , , ,
March 28, 2012

SystemC

How SystemC enables system modelling at higher levels of abstraction, and the creation of virtual platforms.
Guide  |  Topics: EDA - ESL  |  Tags: , , , ,
March 28, 2012

FinFETs

It may be necessary to move to three-dimensional 'FinFET' transistors for future process nodes, but what impact will this have on circuit design?
March 28, 2012

FD-SOI

Fully depleted silicon on insulator (FD-SOI) transistor architectures may offer speed and power advantages, at the cost of a shift to non-standard substrates.
January 29, 2012

Transaction level modeling

Transaction-level modeling (TLM) describes a system by using function calls that define a set of transactions over a set of channels.
Guide  |  Topics: EDA - ESL  |  Tags: , ,
January 16, 2012

Double patterning for sub-28nm ICs

Double patterning provides an alternative to using EUV lithography – making it possible to implement ICs on sub-28nm processes.
Guide  |  Topics: EDA - DFM  |  Tags: , , ,

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