place and route

How the HPC company used Synopsys' Lynx Design System to standardise its flow and simplify migration to the next node.

The FPGA vendor's new flagship is now on public release. It adds an array of features, including support for system-level to HDL synthesis.

Manufacturability, routing, library design and more - it all needs rethinking at 20nm, writes Tong Gao of Synopsys.

A look at the way in which key tools, in IC implementation, modeling and extraction, and physical verification, are developing in response to the challenges of 20nm design

The demands of manufacturing closure at advanced process nodes make the traditional design-then-fix flow unmanageable. At 28nm and below, designers need a solution that can address manufacturing issues at any point in the design process, enabling a true correct-by-construction methodology. An effective solution must provide design-rule-check and design-for-manufacturing analysis using the actual foundry-approved signoff rules [...]

STMicroelectronics in Greater Noida, India recently completed an Omega2 set-top-box decoder IC targeted at HDTV markets. This article discusses how ST used Mentor Graphics’ Olympus-SoC software to address the closure challenges presented by a very large design. It describes how the design team used the tool suite’s chip assembly, concurrent multi-corner multi-mode (MCMM) analysis and [...]

The architectures that underpin today’s traditional place-and-route tools are showing their age, largely because their static timing analysis engines cannot handle more than two mode/corner scenarios. Thus limited, the software struggles to effectively implement low-power design techniques beyond such established concepts as clock gating and multiple threshold voltages. Designers run into difficulties when trying to […]

Signal integrity (SI) is an ever-growing problem as more interconnect effects and fast clocks increase the chances of crosstalk noise and glitches as well as unexpected signal delays. There has been a significant increase in SI-related timing violations due to the increasing influence of lateral wire capacitance in designs at 65 and 45nm. A fast-increasing […]

Concurrent multi-corner, multi-mode analysis and optimization is becoming increasingly necessary for sub-65nm designs. Traditional P&R tools force the designers to pick one or two mode corner scenarios due to inherent architectural limitations. As an example of the problem, a cellphone chip typically needs to be designed for 20 mode/corners scenarios. In the absence of a […]