DATE notebook: Collaboration key to advanced process nodes
Collaboration is becoming increasingly important to foundry companies as the development of advanced process nodes becomes more complex
Tech Design Forum Briefing
Briefing Authors
Paul Dempsey
Paul Dempsey has been a technology journalist for 20 years. His work has also appeared in EETimes, Red Herring and specialist journals published by the Financial Times.
Luke Collins
Luke Collins is a freelance technology journalist with 22 years’ experience. He is a former Editor-in-Chief of Electronics Times in the UK, and co-founded the IP9x series of conferences.
Chris Edwards
Chris Edwards has spent two decades covering electronics and EDA. He is a former Editor-in-Chief of Electronic Engineering Times UK and electronics editor of the IET's Engineering & Technology.
DATE notebook: Mentor adds pattern recognition to GlobalFoundries’ DRC flow
Can pattern recognition improve deign rule checking at advanced nodes?
ARM decodes a surprising power benefit
ARM has found that in its work on processor design looking at the system-design and process issues as well as the way software interacts with the machine can yield surprising results.
Technical Newsletter #2: 14nm and Beyond, Low Power, Double Patterning, CPTF
In this issue Chris Edwards introduces our interviews with key speakers at next week’s Common Platform Technology Forum, and highlights our presence at Cadence’s CDN Live and Europe’s DATE conferences. Dr Mukesh Khare of IBM Research discusses the ‘Innovation Pipeline’ beyond 14nm. Kelvin Low of GlobalFoundries describes how fabless companies can exploit 28nm processes. Michael […]
ISQED focuses on systems, education and sensors
The International Symposium on Quality Electronic Design (ISQED) enters its 13th edition later this month, running March 19-21 at Techmart in Santa Clara. Although ISQED traditionally concentrated on tools and IP blocks, its agenda has broadened as the industry has migrated to SoCs and full electronic systems where process and manufacturing interactions have come to […]
Highlights of DATE 2012
The Design Automation and Test in Europe (DATE) is approaching fast. This year the conference has two special days: one focuses on more than Moore technologies; the other on e-mobility and electric transport.
IMEC readies finFETs for 14nm PDK
FinFETs are among the options in a 14nm process design kit developed by IMEC: a kit that attempts to cater for the effects of immersion and EUV lithography.
ASSP shift continues as design starts fall
Gartner has released its estimates for chip design starts out to the middle of the decade. Both are falling but the emphasis is shifting to ASSPs and mainstream processes.
Technical Newsletter #1: Common Platform, Samsung, ARM, Cadence
Our first email newsletter previews next month’s Common Platform Technology Forum 2012 and features exclusive interviews with senior staff at Samsung, ARM and Cadence Design Systems.
Full-flow 450mm line in 2015 says IMEC
Belgian research institute IMEC has stepped up its plans for 450mm development and now aims to have an operational full-flow pilot line by the end of 2015, according to president Luc Van den hove speaking at ISS Europe this week.