U2U

Mentor Graphics is working on technology to analyse the effects of mechanical stress on integrated circuits, describing progress at the company's U2U conference.

Mentor Graphics has launched Calibre xACT, a tool that uses deterministic algorithms to extract parasitics from complex finFET and other nanometer processes.

Deep learning offers the next major opportunity for specialist processors, Qualcomm's Karim Arabi claimed in his keynote at Mentor Graphics’ U2U in San Jose.

Designers will need to take crime into account as part of their design signoff process, Wally Rhines argued in his keynote at Mentor Graphics' U2U San Jose 2015 conference.