SADP


June 21, 2017

Panels see congestion and resistance dominate the leading-edge node battle

Placement-aware synthesis and an array of post-layout recovery steps have helped drive up the clock speed and silicon utilization of a series high-end SoCs on leading-edge processes developed by customers of Synopsys' implementation tools.
Article  |  Topics: Blog - EDA  |  Tags: , , , , ,   |  Organizations: , , , ,
March 26, 2014

Even EUV faces a 1D future, says IMEC

IMEC's Rudy Lauwereins explained at DATE 2014 how 1D routing for self-aligned multiple patterning is likely to be inevitable even if EUV makes it into production fabs.
Article  |  Topics: Blog - EDA  |  Tags: , , , ,   |  Organizations:

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