EUV

September 11, 2018
Gandharv Bhatara is the product marketing manager for the Calibre OPC/RET products at Mentor, a Siemens Business.

EUV’s arrival demands a new resolution enhancement flow

Gandharv Bhatara looks at how the OPC and RET elements of Calibre are getting ready for the EUV age.
Expert Insight  |  Topics: EDA - DFM, - EDA Topics  |  Tags: , , , , , , ,   |  Organizations: , ,
October 29, 2015
Innovus chip layout

Cadence’s path to digital implementation on 10nm

The 10nm process will see changes to multiple patterning that demands changes in the implementation flow, along with an increased focus on the effects of variability.
January 13, 2014
Steffen Schulze is director of marketing for Calibre Mask Data Preparation at Mentor Graphics

Consider your options for future nodes

If EUV is further delayed until 8nm, the industry has to explore other options for patterning, and the effects they will have on the DFM flow.
December 3, 2013
Dr David M Fried is Chief Technology Officer - Semiconductor at Coventor, responsible for the company’s strategic direction and implementation of its SEMulator3D Virtual Fabrication Platform.

Lithography challenges threaten the cost benefits of IC scaling

The costs of advanced lithography techniques at 1xnm, and the yield and reliability risks from the resultant process variation, will stop many companies getting the typical economic advantages of scaling.
Expert Insight  |  Topics: EDA - DFM  |  Tags: , , , , , , , , ,   |  Organizations:

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