The encryption chain for today's highly collaborative designs needs to be managed with care.
Lithography is only just beginning to play a role in cell IP selection but early analysis already matters.
Using a physically aware flow to ensure that fixing one ECO doesn't introduce another during sign off.
Advanced tools are being applied to established nodes to produce advanced designs for volume markets.
The number of scenarios needed for MCMM timing analysis has skyrocketed. IC implementation calls for a concurrent approach to deal with the issue.
Advanced design isn’t restricted to emerging process nodes any more. Designers are using the latest tools to produce advanced designs on established nodes.
It is not just a choice between EUV and multiple patterning for future nodes, but even between varieties of multi-mask technologies. How will you decide?
A number of effects have led to a dramatic increase in interconnect resistance in the sub-32nm process nodes that demands the use of smarter routing.
Increasingly complex design rules in 14nm and 16nm make it harder to connect local routing to the inputs and outputs (pins) of standard cells.
The HAPS prototyping system can help designers integrate IP into SoCs more quickly.
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