DIBL


December 10, 2012

Oxygen injection for go-faster 14nm transistors

Mears Technologies and UC Berkeley describe at IEDM 2012 how oxygen in a silicon superlattice could boost performance beyond strained silicon at 14nm.
Article  |  Topics: Blog - EDA  |  Tags: , , , , , ,   |  Organizations: ,
May 14, 2012

Intel’s tapered fin reveals short-channel issues

A startup has analyzed the shape of Intel's fins and found the process is not quite as well-behaved as circuit designers would perhaps like.
Article  |  Topics: Commentary, Design to Silicon  |  Tags: , ,   |  Organizations: ,

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