design rules

August 14, 2020
John Ferguson is the product management director for Calibre DRC applications at Mentor, a Siemens BusinessHe holds a B.Sc. degree in Physics from McGill University, an M.Sc. in Applied Physics from the University of Massachusetts, and a Ph.D. in Electrical Engineering from the Oregon Graduate Institute of Science and Technology.

EDA innovation is the foundation of progress

For physical verification and beyond, each process node requires new thinking, new tools and greater performance.
Expert Insight  |  Topics: EDA - DFM, Verification  |  Tags: , , , , , , , ,   |  Organizations:
April 22, 2013
Layout segment showing problem of color splitting with double patterning

The five key challenges of sub-28nm custom and analog design

The arrival of the 20nm and finFET-based 14nm and 16nm processes bring with them challenges for custom IC design. These are the five key areas and a methodology that can address them.

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