body bias

Silicon Impulse program adds partners to ease industrialisation of ultra-low power IC designs based on FD-SOI processes

CEA-Leti has launched a design center called Silicon Impulse with the intention of lowering the entry barrier to using the FD-SOI process.

At the VLSI Technology Symposium a team led by STMicroelectronics described the techniques used for the upcoming 14nm FD-SOI to boost speed and density over the 28nm version.