Synopsys

September 6, 2012
Antun Domic

Getting ready for 20nm

Antun Domic of Synopsys tackles the three key challenges of 20nm processes: design complexity; the physics of lithography; and economics.
Expert Insight  |  Topics: EDA - DFM  |  Tags: , ,   |  Organizations:
August 23, 2011

The Universal Verification Methodology: ready, set, deploy

Mentor’s Dennis Brophy, Cadence’s Stan Krolikoski and Synopsys’ Yatin Trivedi describe how you can prepare to adopt Accellera’s Universal Verification Methodology.
Article  |  Topics: EDA - ESL  |  Tags: , ,   |  Organizations: , ,

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