16nm

March 20, 2013

DATE: Double patterning and finFETs force flexibility on tools

EDA companies are having to plan for the different ways in which double patterning and finFETs could move into fabs, Antun Domic of Synopsys explains.
Article  |  Topics: Blog - EDA  |  Tags: , , , , ,   |  Organizations:
March 20, 2013

DATE: Early shift to finFET processes challenges IP development strategies

An early shift to finFET processes is making developing IP libraries more challenging.
Article  |  Topics: Conferences, Blog - EDA, IP  |  Tags: , , , , , ,   |  Organizations:

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