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Volume 2
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Applying some perspective to DFM
So far, the debate over design for manufacturing (DFM) has featured contributions from, principally, four groups: designers, manufacturers, EDA vendors and the consultancy community. It is becoming increasingly apparent that some other voices need to be heard and their positions integrated within any successful semiconductor DFM chain. One such group is fab equipment suppliers. The […]
IP protection under OASIS
Companies and mask shops already have plans and policies to secure the storage and transmission of sensitive layout VLSI data. These include confidentiality and non-disclosure agreements, and encryption. However, traditional VLSI file formats such as GDSII never popularized the type of constructs that facilitate intellectual property (IP) protection. The OASIS format does have these constructs. […]
Meeting yield enhancement challenges
Nanometer scaling severely inhibits the path to achieve sustainable yield. In response more responsibility for forecasting potential failures must shift to design for manufacturing (DFM) methodologies that can be applied early in the design process. Yet, while these hold much promise, manufacturing test and failure analysis remains at the forefront of determining why chips fail. […]
Analog verification IP and the next stage in the evolution of system-on-chip
Introduction Considerable effort is being exerted to improve the quality and success of system-on-chip (SoC) designs. Given the demand for more and more features, lower power requirements, and need for blazing speeds to handle increasing data for video and other hungry applications, it is no surprise that complex SoCs are becoming harder to verify. A […]
Effects of InfiniBand fixture crosstalk on a synthesized eye diagram
Introduction A synthesized eye diagram begins with an accurate TDT measurement of a linear device. The validity of this approach has been proven across a number of case studies and is now commonly accepted in the communication industry. The measurement allows the device’s eye response to be accurately generated by an advanced synthesis algorithm such […]
Start here
We end the year with an issue of EDA Tech Forum that places perhaps more emphasis on design for manufacture than any before it, with opinions from Gartner Dataquest, Mentor Graphics and Applied Materials. These give readers a chance to view this often controversial and misunderstood area from three different but important perspectives: those of […]
Taking a broad view
The IEEE Council for EDA has opened its website at www.c-eda.org. Earlier this fall, the IEEE Council for Electronic Design Automation (CEDA) took on formal existence with the election of its first officers. Design consultant and one time DAC general chair Alfred Dunlop is its launch president. He sets out why this is a great […]
Which ADC architecture is right for your application – Part One
Introduction Selecting the proper ADC can appear a formidable task, considering the thousands on the market. A direct approach is to go to the selection guides and parametric search engines. Enter the sampling rate, resolution, power supply voltage, and other properties. Click ‘find’. And hope for the best. But it’s usually not enough. How does […]
DFM will change the industry’s business models
Introduction As semiconductor manufacturing moves into the sub-100nm realm, the need for increased cooperation and communication between design and manufacturing becomes more apparent. Manufacturing is becoming increasingly complex, and many of the principles that have guided design and manufacturing no longer apply. Some of the major changes occurring in wafer manufacturing include: The industry is […]
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