EDA Topics

December 1, 2005

Which ADC architecture is right for your application – Part One

Introduction Selecting the proper ADC can appear a formidable task, considering the thousands on the market. A direct approach is to go to the selection guides and parametric search engines. Enter the sampling rate, resolution, power supply voltage, and other properties. Click ‘find’. And hope for the best. But it’s usually not enough. How does […]

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December 1, 2005

Taking a broad view

The IEEE Council for EDA has opened its website at www.c-eda.org. Earlier this fall, the IEEE Council for Electronic Design Automation (CEDA) took on formal existence with the election of its first officers. Design consultant and one time DAC general chair Alfred Dunlop is its launch president. He sets out why this is a great […]

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December 1, 2005

Behavioral IP reuse methodology

No one disputes the promise inherent in the concept of design reuse. But the true value of what has been delivered so far is often debated. This paper proposes a reuse methodology that is both practical and real and which uses behavioral synthesis as its driving technology. It discusses the most basic elements of behavioral […]

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December 1, 2005

Effects of InfiniBand fixture crosstalk on a synthesized eye diagram

Introduction A synthesized eye diagram begins with an accurate TDT measurement of a linear device. The validity of this approach has been proven across a number of case studies and is now commonly accepted in the communication industry. The measurement allows the device’s eye response to be accurately generated by an advanced synthesis algorithm such […]

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June 1, 2005

A methodology of integrated post tape-out flow for fast design to mask TAT

Semiconductor devices are being fabricated with features that are less than half the wavelength of the available lithography exposure tools. Increasing circuit density has improved the complexity and performance of ICs but also led to serious patterning proximity effects. These effects make the chips almost impossible to fabricate without optical proximity correction (OPC) technology. Thus, […]

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June 1, 2005

Achieving better DFM: EDA tools pave the way to improved yield

Major yield-Inhibiting Issues At each successive process node, additional defect mechanisms appear and hinder the ability to achieve desired yield (Figure 1). The trend toward declining yields has led to a resurgence in the application of design for manufacturing (DFM) methodologies.Much of this reinvigorated effort relies heavily on a new breed of tools and technologies. […]

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June 1, 2005

The whole picture

Once upon a time, placing even the smallest question mark next to Moore’s Law was seen as something beyond heresy. Today, more and more people are voicing such thoughts in the mainstream. One of the most senior figures speaking out is Bernard Meyerson, vice president and chief technologist of IBM’s Systems & Technology Group. The […]

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June 1, 2005

Innovate in volume

If one thing has become clear as process geometries have gone below one micron, it is that the traditional development model is broken. It seems only recently that companies were talking about adopting a greater ‘customer focus’, but even the linear sequence of first, finding out what the client wants; second, getting your designers to […]

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June 1, 2005

Formal verification poised for rapid growth

Design teams are becoming increasingly concerned at the growing disparity between the capacity of silicon in the latest processes and the design and verification capabilities of simulation tools. A number of trends are now converging to enable a step function increase in verification to complement and extend the debug and verification capabilities of HDL simulators. […]

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June 1, 2005

The ultimate wish-list

If you want to get a clear idea of just what is taxing engineers at any given time, you can do a lot worse than following the trends that emerge before each annual Design Automation Conference (DAC). “And this year, it is pretty clear that there are three things on everyone’s mind: power, system-level design […]

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