EDA Topics

September 1, 2006

SPIRIT achieves maturity with IP-XACT specifications

Introduction Complete system-on-chip (SoC) design assembly, configuration and verification environments emerged in the 1990s to address an increasing design gap between the capacity of silicon and the ability of engineering teams to fill that gap meaningfully with optimized system designs. Despite the need being addressed by these early environments, adoption was slow. In this context, […]

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September 1, 2006

The ‘What’, ‘When’, and ‘How Much’ of functional coverage

Up to 80% of the overall design cycle time can today be spent on verification. Constrained-random testing (CRT) was developed in response to greatly reduce the amount of code needed to create a verification environment. However, CRT-based methodologies that do not include functional coverage are analogous to shooting blind [1]. Functional coverage provides essential feedback […]

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September 1, 2006

Verifying complexity with an all-encompassing methodology

The increased size and complexity of designs continues to push design and verification methodologies to progressively higher levels of abstraction. These upward shifts in abstraction tend to occur about every decade or so, and we are currently experiencing one in the shift from RTL to transaction-level modeling (TLM). Abstractions must eventually be converted back effectively […]

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September 1, 2006

Visibility enhancement for full-chip simulation

The most expensive parts of today’s system-on-chip (SoC) design flow are where engineers must engage in direct manual effort or expend their energy making decisions. Unfortunately, far too much time and money are wasted on tasks that do not add value — such as trying to figure out if supposedly correct intellectual property (IP) is […]

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September 1, 2006

A top-level verification methodology including power supply and signal check using mixed-signal simulation

The ‘state-of-the-art’ solution for wireless transceiver RF ICs is single chip CMOS, integrating digital, analog, and RF blocks on a single chip. The architectures involved require new and challenging approaches to verification. To understand these, we first need to look back at the history of the transceiver architectures used for wireless mobile phone implementations during […]

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June 1, 2006

Addressing the design closure crisis

Why are more chips late to market and cost three times more to design at 90-nanometer (nm) than at 130nm? Today’s ASSPs and ASICs are huge, approaching one billion transistors, with clock speeds exceeding 1-GHz. Engineers struggle to manage the complexity of devices that achieve these levels of performance and size. A natural reaction to […]

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June 1, 2006

Back on the bay

Ellen Sentovich As EDA Tech Forum went to press, the programme for 2006’s Design Automation Conference (July 24-28) in San Francisco was only just being made public. However, one thing was already clear. The event is set to be bigger than ever before. “We had been concerned about the move to July because of the […]

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June 1, 2006

Deploying the right tools for mixed signal verification

Engineers on the leading edge of nanometer design are dealing with physical effects that change the way mixed-signal ICs are verified – in timing, power, reliability and yield. With the IC verification effort accounting for 60-80% of the development cycle, choosing and deploying the right mixed-signal verification solution can significantly improve productivity and the return […]

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June 1, 2006

Design and manufacturing unite to tackle process variability

Analyses made by semiconductor manufacturers have demonstrated that maintaining pattern fidelity is critical, and that this task faces increasing limitations at the 65nm process node and below. At these technology nodes, even the most advanced resolution enhancement technologies (RET) have a difficult time with certain layout topologies.  When the impact of this is observed across […]

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June 1, 2006

High quality yield modeling is critical for DFM

Design-for-manufacturability (DFM) has become pervasive and there is general agreement on the need to apply DFM at multiple stages of the design cycle. DFM techniques at the relatively mature 0.13um technology node entail well known enhancements such as contact and via redundancy, line-ends and borders, and wire spreading. Mature technology nodes achieve product yields which, […]

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