May 26, 2014
In the absence of EUV lithography, the primary option for manufacturing on a 10nm process is to extend double patterning. But the options each have issues.
June 2, 2011
DRC+ is a new methodology that algorithmically characterizes design variation through pattern classification. A traditional design rule is used to identify all design structures that share a common configuration. Then, the 2D geometric situations (pattern variations) around the configuration are extracted and classified. Since all such classes share a common configuration, each situation class represents [...]
May 1, 2010
DFM is essential to differentiating your products in the market, says Luigi Capodieci