June 1, 2006
Productivity levels for hardware design, specification, simulation and validation have been raised by the formal approval of IEEE 1800 SystemVerilog as an industry standard. Evolved from the Verilog hardware description language, SystemVerilog is now the language of choice for developing verification and design intellectual property (IP). As a result, EDA companies are progressing rapidly in […]
Article | Tags:
June 1, 2006
Designers thinking about low power and energy have a variety of strategies at their disposal. The most common are: Process/libraries (e.g. low-power processes/libraries; high and low threshold voltage cells; and voltage scaling); Power and voltage domains; Clock gating; Low-power optimized clock synthesis; Low-power synthesis (e.g. automatic insertion of operand isolation circuitry); Implementation optimizations (e.g. operand […]
Article | Tags:
June 1, 2006
Slowly but surely, the doors are opening. By that I mean that foundries and some IDMs are finally releasing significant amounts of fab process data for incorporation within the design for manufacturing content of EDA tools. Kudos must go to the IBM, Samsung and Chartered Semiconductor Manufacturing triumvirate for being first out of the gate. […]
Article | Tags:
June 1, 2006
As the third wave of the digital revolution finally gains momentum, the chip industry is breaking loose from its homogeneous telecom/PC-centric confines – where everyone’s product and box essentially looked and worked the same – into the arms of the fragmented consumer-centric heterogeneous multimedia, with significantly more brand names and lots of different price points. […]
June 1, 2006
Walden Rhines The official mission statement of the EDA Consortium (EDAC) says that the organization exists “to promote the health of the EDA industry, and to increase awareness of the crucial role EDA plays in today’s global economy.” EDAC’s chairman Wally Rhines, also chairman and CEO of Mentor Graphics, amplifies this by explaining that the […]
June 1, 2006
Kerry Bernstein When Kerry Bernstein, a 28-year IBM veteran, was first drafted to work on Big Blue’s development of 3D semiconductors, he admits he was a skeptic. “At first, I think I felt as though I’d got dragged into this program. I thought it wasn’t going anywhere. I thought it was going to go anywhere. […]
Article | Tags:
June 1, 2006
Joe Costello The dominant theme for DAC 2006 is multimedia, games and entertainment. So how does Cadence Design Systems founder and former CEO Joe Costello fit into that? He is after all giving the conference’s Monday keynote. Let’s do the ticklist. EDA credentials? Dated – he left Cadence in 1998 – but basically a ‘check’. […]
Article | Tags:
June 1, 2006
Design-for-manufacturability (DFM) has become pervasive and there is general agreement on the need to apply DFM at multiple stages of the design cycle. DFM techniques at the relatively mature 0.13um technology node entail well known enhancements such as contact and via redundancy, line-ends and borders, and wire spreading. Mature technology nodes achieve product yields which, […]
Article | Tags:
June 1, 2006
Ellen Sentovich As EDA Tech Forum went to press, the programme for 2006’s Design Automation Conference (July 24-28) in San Francisco was only just being made public. However, one thing was already clear. The event is set to be bigger than ever before. “We had been concerned about the move to July because of the […]
June 1, 2006
Analyses made by semiconductor manufacturers have demonstrated that maintaining pattern fidelity is critical, and that this task faces increasing limitations at the 65nm process node and below. At these technology nodes, even the most advanced resolution enhancement technologies (RET) have a difficult time with certain layout topologies. When the impact of this is observed across […]
Article | Tags: